Used LAM RESEARCH 490 #293778205 for sale

LAM RESEARCH 490
Manufacturer
LAM RESEARCH
Model
490
ID: 293778205
Etcher.
LAM RESEARCH 490, also known as the Echer/Asher, is an advanced etching and ashing equipment used in the semiconductor industry. 490 Etcher/Asher provides superior speed, precision, and reliability for the critical etching and ashing processes of semiconductor devices. This industry-leading system is capable of processing wafers up to 200 mm in diameter and can meet the demanding performance requirements of wafer preparation, photoresist stripping and cleaning, hardmask etching and strip, and dopant redistribution. LAM RESEARCH 490 Etcher/Asher uses advanced technology to provide critical unit control and process monitoring, enabling precise adjustment of substrate temperature, pressure and the addition of process gases. Its standard wafer thermal management machine features segmented heater control and independent substrate sensor bands, ensuring replicable process results. The high-precision tool provides steady state process temperature-control to within 0.2°C per surface, while six strategically positioned chilled water manifolds provide uniform cooling. 490 Etcher/Asher is highly configurable and can be tailored to the needs of specific processes. Its flexibility and advanced process control asset ensures superior etch profile uniformity and high process productivity. Its plasma source can be configured for a variety of etching process chemistries including chlorine-based, bromine-based, and fluorine-based chemistries, and its high-power RF generators provide process reproducibility and feature excellent impedance matching. LAM RESEARCH 490 also offers advanced conformal cooling in which liquid coolant is circulated through the anode, keeping the temperature of the plasma source consistent during the process. 490 provides sophisticated monitoring and control capabilities that enable its users to adjust various process components to ensure optimal wafer performance. This includes the flexibility to program independent parameters for each wafer-type, the ability to program a wide range of temperatures, pressures, and gas flows, and an 'auto clean' feature that activates just before the run begins, minimizing process interface. Additionally, the model's remote diagnostics capabilities allow users to troubleshoot issues remotely, providing real-time feedback with minimal downtime. Overall, LAM RESEARCH 490 Etcher/Asher provides the speed, precision, and reliability needed for sophisticated etching and ashing on a variety of materials. Its advanced process control equipment and flexible configurability make it an ideal choice for production of microelectronic components.
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