Used LAM RESEARCH 490 #9031604 for sale

LAM RESEARCH 490 is an advanced plasma etcher and chemical asher. It is part of LAM's E Series Plasmas and Ashers, which are designed to produce high-precision etch patterns on a variety of substrates, including dielectric, polyimides and SiO2 materials. The LAM 490 operates at a nominal power of 300W and combines extended etch time capability with low contamination levels and improved uniformity. LAM RESEARCH 490 comes with a variety of gas line and pressure capabilities, which can be adjusted to accommodate a wide wide range of process pressure and concentration. This range of flexibility allows for applications with a variety of cell types, including, but not limited to, dual-level etch, stepped etch and modifications for advanced applications, such as vertical profiles. 490 also has excellent out-gassing, which allows it to maintain precision with difficult etching scenarios, such as, plasmas formed from carbon, fluorine and oxygen materials. Additionally, the etch selectivity which can be achieved using LAM RESEARCH 490 is superb and it is often utilized in areas, such as, wafer surface preparation, chemical-mechanical planarization (CMP) and inter-level dielectric etching. Another advantage of 490 is that it has a wide range of chamber configurations and options, such as, a two-stage or two-stage ion source, rotary and linear antenna arrays, variable pressure capability and integrated cleaning functions. This allows it to be tailored to meet the specific needs of a customer. Furthermore, it comes with high power, repeatable etch timers, which gives operators the ability to accurately control process time, with minimal variance. In addition, LAM RESEARCH 490 features a DC-RF power source with adjustable power levels, and adjustable frequency, which allow for more precision etching. Overall, 490 is an ideal advanced plasma etcher and chemical asher for a multitude of industries and applications. Its state-of-the-art design allows for improved efficiency, accuracy, and quality control with a variety of process etching requirements. Its versatility and precision make it an excellent choice for high-end, complex projects.