Used LAM RESEARCH 490 #9094106 for sale
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ID: 9094106
Wafer Size: 4"-6"
Automatic plasma etcher, 4"-6"
Process: polysilicon, refractory metal silicides and nitrides
Wafer alignment capabilities
Built-in wafer transport mechanism
Computer controlled I/O: runs, executes recipes, hazard warnings and malfunctions
Currently non-operational in a cleanroom.
LAM RESEARCH 490 etcher/asher is a high-efficiency, high-throughput equipment for etching and ashing of wafers, providing a high degree of flexibility for various processes. The system employs advanced design techniques to deliver predictable process results. It is well-suited for low-k, high-density interconnects, research and development applications and production processing of semiconductor devices. 490 is a single-chamber unit that consists of two main components: the Reactive Ion Etcher and Asher (RIEA) and the RF power supply. The RIEA utilizes a magnetically confined arc to generate the etch process. An arc is generated between the wafer and the cathode by the application of negative potential. The arc spray is focused using a water-cooled ETCH concentric ring to constrain the ion's motion and to direct ions toward the wafer. The RF power supply provides adjustable DC power (ranging from 0 to 500W) for optimized plasma generation, independent of the chamber pressure. The machine is fully-integrated and easy to use, with a flexible software architecture and built-in safety features that provide process control capabilities. Additionally, the tool has a high repeatability rate, a fast cycle time and a low risk of wafer warp. LAM RESEARCH 490 provides a wide range of etch and ashing options, with a customizable process library that allows users to tailor the asset to their specific applications. The model is designed to operate with a wide range of cleaning chemistries, while enabling high-throughput and highly-controlled etching and ashing processes. 490 is designed to meet or exceed the requirements of several industry standards for semiconductor fabrication. It is compliant with ISO 9001:2015, US FDA 21 CFR Part 11, and SEMI Sec 7. LAM RESEARCH 490 is an excellent choice for any etch and ashing application in the semiconductor industry. It provides an effective, high-efficiency and high-throughput equipment for performing a variety of etch and ashing processes with a high degree of process control, repeatability and safety.
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