Used LAM RESEARCH 490 #9112923 for sale

LAM RESEARCH 490 is an etcher/asher designed to process thin film conductive materials. It is a chemical vapor deposition tool that utilizes a variety of chemical compounds to evaporate and form a thin film of a desired material. 490 is capable of producing thin films with thicknesses down to nanometer level and with a uniformity of composition. The tool provides high throughput and ease of operation which ensures that thin films can be fabricated quickly and accurately. LAM RESEARCH 490 is designed with a standard vacuum chamber that can accommodate up to four wafers with diameters ranging from 2 to 8 inches. The tool can also process up to four substrates of varying sizes. The vacuum chamber is cooled by an air circulation equipment and is heated by two independent chamber heaters. This ensures uniform and consistent temperature across the entire wafer during the process. 490 is capable of generating high pressures, up to 10 Torr, during etching or ashing and can be programmed to achieve precise reproducible results. LAM RESEARCH 490 is equipped with a quartz evaporation source capable of achieving temperatures up to 2800°C. This allows for a wide variety of materials to be deposited, including negative and positive photoresist and metals like gold, copper, and aluminum. The source can also be used for pre-treatment of wafers before processing to ensure increased adhesion of thin films. 490 also is equipped with a Frequency Scanning System which is used to ensure ashing/etching uniformity over larger substrate areas. With this unit, a user can select the frequency at which the process should be applied, thus allowing for rapid and accurate production of the desired material. LAM RESEARCH 490 is also equipped with a remote monitoring machine that can provide real-time data on the tool and its processes. This allows for immediate adjustments to be made to improve tool performance and ensure the best quality products are produced. Additionally, the tool is designed with a multiple wafer monitoring tool that tracks the chemistry and temperature of each wafer during the etching/ashing process. 490 is a robust and reliable asset that is ideal for fabrication and review of thin film conductive materials. This model provides an optimal combination of uniformity and accuracy, in a cost-effective manner.