Used LAM RESEARCH 490 #9196387 for sale

LAM RESEARCH 490 is a state-of-the-art etcher/asher with plasma and photo resist technologies. It is designed to etch materials, such as metals, plastics, ceramics, and thin films, with very precise tolerance control. This makes it ideal for creating intricate patterns and features for high reliability electronic and optoelectronic components. 490 is equipped with an automated wafer handling mechanism which facilitates loading and unloading during etching. This mechanism ensures uniformity in the etching processes allowing for repeatable results. It also has a wafer alignment process to minimize errors during etching and minimize subsurface damage. LAM RESEARCH 490 offers both RF and DC etching. RF etching allows for etching without generating excess ions typically generated by higher temperate processes, thus preventing material contamination and improving the quality of the etched results. DC etching, on the other hand, uses a low-current etching procedure which increases the etch rate and reduces etching times. The asher portion of 490 accommodates both short and long typical etching/scribing runs. It can also be used to apply photo resists on wafers before etching. LAM RESEARCH 490 is unique in its ability to etch and asher with very high repeatability and uniformity across a wide range of wafer diameters. 490's control system is a closed loop system incorporating internal sensors which allow for optimal etching parameters for different materials and process types. These sensing capabilities also monitor any sudden changes which could cause process instability. Overall, LAM RESEARCH 490 is a reliable and highly accurate etcher/asher which can be used for a variety of photoresist and etching processes. Its features and capabilities help it achieve optimal etching performance and quality in quick turn around times.