Used LAM RESEARCH 490 #9226106 for sale

LAM RESEARCH 490 asher/ etcher is an advanced, high-performance advanced etching/ashing equipment that is designed to provide clean, repeatable results in a wide range of etching processes. 490 can be used to etch a variety of substrate materials such as wafers, metals, polymers, and glasses. It has a standard operating temperature range of 100-420 °C, 4 programmable repeatable processes, and a built-in temperature controller. LAM RESEARCH 490 can be used to etch different materials with different techniques, making it ideal for a wide range of etching processes. The system uses the rapid thermal annealing (RTA) process- a method of rapidly heating and cooling substrates to rapidly and evenly etch a specified depth. It is compatible with a variety of gases, including halogen and fluorocarbon mixtures- allowing for accurate and repeatable processes. 490 features a gas box module and a vacuum pump unit that work together to deliver precise etching results. The gas box module houses all the components needed to create a controlled atmosphere, such as the nozzle, flowmeter, and the pressure controller, while the vacuum pump module maintains a constant and stable etching environment. LAM RESEARCH 490 is also equipped with advanced control technology, such as a display screen, keypad, and a control module- providing operators with complete control over the etching process. 490 is fully automated and can be programmed to etch multiple substrates simultaneously, with a typical cycle time of less than five minutes. The machine's long-life capacitors and efficient thermal design ensures uniform and repeatable results. It also features a unique cooling tool which helps minimize downtime and capital cost. In summary, LAM RESEARCH 490 is a high-performance etching/ ashing asset that delivers clean and repeatable results for a wide range of etching processes. It is equipped with advanced temperature controllers, a gas box, and vacuum pump module, as well as a sophisticated control model which allows the user to precisely control the entire process. It is an efficient, reliable and cost-effective equipment which can be used to etch a variety of substrate materials with a typical cycle time of less than five minutes.