Used LAM RESEARCH 490 #9226288 for sale

LAM RESEARCH 490
Manufacturer
LAM RESEARCH
Model
490
ID: 9226288
Wafer Size: 6"
Vintage: 1990
Etcher, 6" 1990 vintage.
LAM RESEARCH 490 is a state-of-the-art etcher / asher used in the semiconductor industry. It provides the technology to etch and asher layers that are part of integrated circuit fabrication. This machine is designed to operate with both wet and dry process chemistry and can handle different types of substrates. It is a fully automated, fast and highly accurate etch / asher for critical semiconductor devices. 490 can operate up to five process chambers at once. All process chambers have an integrated PFPE abatement system that helps reduce emissions of hazardous materials. It also includes an auto-alignment system for robust wafer to wafer consistency. Each chamber features outstanding etch uniformity and etch rate uniformity. It includes a proven inductively coupled plasma (ICP) source for stable, high-uniformity etching and ashing under a wide range of conditions. LAM RESEARCH 490 has flexible recipe options. It can reach a maximum temperature of 700°C and multiple gas flows which can be individually tuned to match the process recipe. Etch rate is adjusted by the mass flow controller (MFC) to fine-tune the substrate surface finish. For ashing, UV plasma based ashing technologies can be used to create the desirable surface finish. 490 provides advanced diagnostics such as automatic pattern recognition and defect detection. It also offers pre-etched or as-etched surface roughness control and multi-layer etch applications. The etch process also includes deposition control for uniformity which helps reduce substrate loss rates. LAM RESEARCH 490 also offers single iteration processes for improved process efficiency and yield. Overall, 490 is an extremely versatile and reliable etcher / asher that provides consistent results for advanced semiconductor device fabrication. With its advanced features and powerful capabilities, it is the perfect etcher / asher for meeting the demands of the most complex applications.
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