Used LAM RESEARCH 490 #9232674 for sale

LAM RESEARCH 490 is an Etcher/Asher equipment used for processing semiconductor wafers. This machine is capable of efficiently etching and ashing a wide variety of materials on wafers up to 304.8 mm (12") in diameter. It utilizes a 1350 mm (53.15") Plenum Chamber, which is designed for dual-sided wafer processing; the wafers can be loaded with standard cluster tools, thus allowing a single piece of equipment to process both sides of the wafer simultaneously. The system is highly modular, providing flexibility at the component level to allow customization to meet specific needs. 490 features a large chamber volume with high-performance plasma to handle both etching and ashing applications over a wide range of operating parameters. LAM RESEARCH 490 utilizes a robust, one-piece stainless steel passivated chamber designed to minimize plasma-induced particle generation and ensure temperature uniformity. The unit is operated in a clean environment and is capable of direct sidearm loading for high purity and minimum contamination. To ensure consistent repeatable results, the etching and ashing processes are controlled by an advanced plasma controller. The intuitive OS-based controller provides a graphical representation of the process conditions to ensure consistent repeatability. The machine also features a fast and uniform RF power distribution to ensure optimal etching and ashing performance. 490 is capable of etching and ashing any type of material. It is designed with a range of different gases, such as chlorine, argon, hydrogen, and others to suit various material requirements. It also has the capability to perform multi-step etching processes for precise etching of intricate structures. The bake capacity of this tool is also impressive, as it can bake up to 450°C (842°F) with a continuous temperature control. To complete the process, a dynamic end-point detection asset helps to verify process results, ensuring the proper endpoint has been obtained. Overall, LAM RESEARCH 490 is an effective etcher/asher model that is suitable for a wide range of applications. With its sophisticated chamber and computer-controlled tools, 490 can deliver consistent, repeatable results with minimal contamination. The high-performance RF power distribution, temperature uniformity, and multiple gas capability offer the flexibility to customize the etching/ashing processes to meet any specific needs.