Used LAM RESEARCH 490 #9242239 for sale

LAM RESEARCH 490 is an etcher/asher designed for the fabrication of semiconductor devices. The tool was specifically developed to enhance the process of semiconductor device processing, allowing for a more efficient and accurate etching and ashing of substrates. 490 utilizes different pressure and temperature conditions allowing for specific etch/ash processes. The tool is outfitted with multiple recipes on the same substrate to provide improved yield. The process allows for targeted etching and ashing in defined process areas, allowing for a more uniform end product. The low-pressure plasma asher is used for ashing of organic material and is also used for plasma desmearing. The low-pressure plasma allows for a fast etching process without damaging the substrate and leaves a very clean surface with good uniformity. The high-pressure plasma etcher is designed to efficiently etch metals, oxides and polymers. The system uses Oxygen, Cl2, and SF6 gases to remove material down to the desired thickness. LAM RESEARCH 490's automatic control system allows for stable etching, ensuring a consistent end product. 490 is designed to bring enhanced process capabilities to the semiconductor industry. Its multiple process capabilities allow for flexible and accurate processing of substrates and its high pressure etching ensures accurate etching and an improved yield. LAM RESEARCH 490 has been designed with an automated control system to ensure the process is reproducible and the high pressure air-cooled mechanism keeps the plasmas clean, allowing for a more accurate etch and ashing of semiconductor device substrates.