Used LAM RESEARCH 490 #9251245 for sale

LAM RESEARCH 490 is a high performance etcher and asher used in the etching and cleaning of a wide range of materials, including metals, polymers, silicon, and other semiconductor materials. It is a multi-chamber structure with a load port and substrate cassette, a single load lock, a pre-clean chamber, an etching chamber, a post-clean chamber, and a purge chamber. The machine is designed for the etching and cleaning of semiconductor wafers in a single processing chamber, allowing for simultaneous or sequential processing of multiple substrates. 490 utilizes a highly configurable process recipe that is built according to the application requirements. It can be programmed with variable sources of RF, DC and AC power, as well as other parameters such as pressure, temperature, flow rate, and plasma residence time. The equipment is outfitted with a high-resolution direct vision camera that can be used to monitor the process. The machine is also equipped with a data logging system that records all process parameters and conditions. LAM RESEARCH 490 can be used for high resolution etching, as well as reactive ion etching, deep reactive ion etching, oxide etching and oxide etching with high selectivity of different materials, as well as etching of advanced materials such as chemical vapor deposited thin films. Additionally, the unit can be used for substrate cleaning such as wet etching, electropolishing or substrate cleaning with chemical etching agents or gases. 490 machine is designed for a standard production environment, providing rigorous platform level control of the process and high throughput. The tool is easy to operate and has a user-friendly interface, making it ideal for wafer-processing applications. The modular design also offers flexibility and scalability, allowing for efficient integration with other fabrication equipment and processes. LAM RESEARCH 490 is reliable and durable, making it suitable for long-term use in production environments.