Used LAM RESEARCH 490 #9268075 for sale

LAM RESEARCH 490 is a plasma etch/asper equipment, designed for production and research. It offers high throughput with advanced process control and tight chamber uniformity. The system is capable of high performance etch/asper of both hard and soft materials, such as oxides and nitrides. The etching and asphering are performed with a high level of accuracy. The chamber has a tight uniformity, making it robust and easy to use. The unit is also equipped with plasma diagnostics and a highly sophisticated process control machine for precision etching and asphering. The reactor is equipped with a plasma source and a specialized array of electrodes tailored for the etching or asphering of different materials. The plasma is generated by a mixture of gases, such as chlorine, sulfur hexafluoride, and oxygen, that are injected into the chamber. The chamber is usually filled with the desired process gas, pumped in and out to maintain the optimal pressure and temperature. Various process parameters can be changed in order to optimize the process. The pressure, temperature, and DC bias of the chamber can be adjusted in order to obtain desired etching and asphering rates. The parameters can also be tuned to fine-tune the etching quality and profile of the product. The chamber can also be preset to the desired settings allowing complete process control during the production cycle. The tool is also equipped with safety features, such as gas detectors and pressure regulators. The gas detectors allow the asset to be shut off in the event of hazardous gasses being detected while the pressure regulators ensure the chamber pressure and temperature stay within the necessary range. 490 is an advanced etch and asper model, offering reliable and precise etching/aspering for hard and soft materials. Its combination of advanced process control and tight chamber uniformity make it an effective tool for both production and research-based processes.