Used LAM RESEARCH 490 #9277853 for sale

LAM RESEARCH 490 etcher /ascher is a high-performance chemical vapor deposition (CVD) equipment designed for the efficient production of thin-film depositions on semiconductor wafers. This system is capable of depositing dielectrics, polymers, and semiconductor materials with a high level of accuracy and repeatability. 490 offers a straightforward graphical user interface and an intuitive operating unit designed to minimize user input while maximizing throughput. With two independent deposition chambers, LAM RESEARCH 490 offers the ability to deposit two different materials on the same substrate at the same time. This makes it possible to create complex structures quickly and efficiently. 490 utilizes a low-cost quartz reactor to perform chemical vapor deposition of polymers, dielectrics, and semiconductor materials without exposing the substrate. The reactor is equipped with internal heaters that allow for precise temperature control and gas flow management, enabling highly reproducible deposition of high-quality layers. This ensures excellent uniformity and repeatability from deposit to deposit. LAM RESEARCH 490 offers a range of programmable process parameters for deposition of complex materials. Parameters such as substrate temperature, pressure, gas flow rate, chamber pressures, and gas type can be adjusted to optimize the process. Additionally, the machine offers an air shield design that facilitates cost-effective mass production, while reducing the risk of wafer contamination. 490 also features process monitoring systems to ensure deposition uniformity, eliminating the need for expensive process monitoring equipment. Its built-in exhaust tool allows for careful management of chamber exhausts, providing improved process control and longer component life. Overall, LAM RESEARCH 490 etcher/ascher offers a high level of performance and flexibility, making it ideal for any application involving the deposition of thin film on semiconductor wafers. With its powerful features and cost-effectiveness, 490 is an ideal solution for rapid, high quality production of numerous thin film deposition types.