Used LAM RESEARCH 490 #9398854 for sale

LAM RESEARCH 490 is a high-performance etch/ash solution designed to meet the needs of the manufacturing industry. The unit consists of a processing chamber, support frame, power supply, safety interlock, and isolation valve. The processing chamber is equipped with gas management equipment and a chemical delivery system, allowing for precise control of a wide range of process conditions. Its platform technology uses the latest in ceramic-packaged substrates and a range of etching and depositing systems for materials including silicon, aluminum, copper, and more. The processing chamber contains a range of adjustable parameters to enable the customization of etching and deposition profile for optimal performance. For example, the temperature can be controlled from 20°C to 1000°C and substrate temperature from 300°C to 2000°C. The pressure range is from 1 mbar to 500 mbar, while the process gas type can be selected, either He, Ar or O2. The gas flow rate can be adjusted through, depending on the process needs. A pressure and temperature gauge is provided, with the ability to read the process conditions in real-time. The unit is also equipped with several features to improve safety, like a front-mounted fence, remote lining switch, and electrostatic discharge (ESD) control unit. It ensures compliance with current safety regulations by providing personnel protection and preventing hazards. Additionally, 490 is designed with a low thermal budget to reduce the risk of sample degradation. LAM RESEARCH 490 also has a tri-automated port option, allowing for easy maintenance and repair of its components. This feature makes it an ideal solution for quick installation and seamless operation. Overall, 490 is a Multi-Application Wafer Processing Machine that is capable of performing various etching and depositing processes on various substrates, making it an essential asset to the ablation and patterning needs of the semiconductor and manufacturing industry. Combined with its reliable, energy-efficient performance, it serves as an efficient and cost-effective solution for the etching and depositing needs of the industry.