Used LAM RESEARCH 571-065780-702 #293668180 for sale
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LAM RESEARCH 571-065780-702 is a high performance, multi-zone etcher/ asher designed for non-volatile etch and/or clean processing. This equipment includes multiple full-wafer monatomic and pneumatic wafer handling capabilities, in addition to two independent, integrated, high-vacuum process modules. The modules include both etch and asher capability, allowing quick changes between etch and asher operations as necessary. The independent process modules provide flexibility and improved throughput, with each module capable of holding up to two wafers, allowing extended etch and clean times. Each process module includes a load-lock chamber, substrate transfer chamber, cryo-etch/ deposition chamber, and a high-energy plasma chamber. The transfer chamber is configured to fit one 300mm wafer on a standard carrier. The carrier can easily be adapted for other wafer sizes. The engine includes multiple gas distribution manifolds for enhanced process uniformity and control, and is capable of supporting up to four shielding gas sources for improved process flexibility. The etcher/ asher is equipped with ultra-high vaccum pumps to facilitate high vacuum performance, which is necessary for producing high-quality etches. The process window can be tuned via the process control system, offering improved process control and uniformity. The high precision wafer transfer unit provides smooth and precise motion, as expected from LAM RESEARCH systems. The adjustable wafer positioner offers a high degree of repeatability and accuracy of wafer placement. Overall, 571-065780-702 is a highly advanced, multi-zone etcher/ asher designed for a wide range of etching and processing needs. It provides improved process uniformity, reliability, and throughput, along with advanced process control software. The precision wafer transfer machine guarantees excellent repeatability and accuracy, while the wide array of gas distribution channels ensures precise process control. It is an excellent choice for achieving high-quality etches and is highly recommended for industrial applications.
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