Used LAM RESEARCH 571-065780-703 #293668173 for sale

LAM RESEARCH 571-065780-703 is an etcher / asher specifically designed for plasma etching applications. This model possesses a high level of performance with its efficient 20 MHz oscillator producing pure, low pressure plasmas that optimize etch rate and quality. The self-contained design incorporates a triode-type electron-bombardment ion source, a process chamber, and a high-performance gas distribution network. It utilizes an advanced single pocket design for high uniformity of pressure, temperature, and gas distribution over the etch area. This model also features a self-avoiding chuck and an automated wafer transfer equipment. This combination of features guarantees improved etching quality across a wide range of process conditions. 571-065780-703 also features an advanced dual-chamber process chamber that enables two parallel processes to run simultaneously. This feature enables more efficient throughput and improved quality and throughput when performing multiple processes. The process chamber also includes a thermal barrier, which serves as a protective shield from the plasma, ensuring uniform temperature for the entire process area. The thermoelectric cooling system is also included to reduce the heating effect caused by the plasma. The entire unit is enclosed in a low material environment, further improving etching efficiency and product quality. LAM RESEARCH 571-065780-703 is also equipped with advanced control software, allowing for automated process control and recipe technology for optimal etching results. This machine includes an intuitive human-machine interface, which enables efficient and precise control over the etching process parameters and recipes. Additionally, this state-of-the-art control tool allows users to customize etching parameters according to their individual production needs and requirements. Overall, 571-065780-703 is an impeccable etcher / asher for high-flow plasma etching applications. It is recognized for its efficiency, superior process control, and its ability to guarantee quality and uniformity across a wide range of etching conditions.