Used LAM RESEARCH 590 #293604252 for sale

LAM RESEARCH 590 is a type of asher that is used as part of a process for etching/ patterning electronic components on a material surface. It is a single-wafer asher which means it is only capable of processing one wafer at a time. This offers the advantage of better process control with less variation from wafer to wafer, because only one wafer is present in the process chamber at a time. 590 is equipped with a resist pre-bake chamber, a plasma generator, and a gas manifold. The pre-bake chamber is used to heat up the surface of the substrate for better adhesion of the photoresist. The plasma generator creates a plasma environment using a combination of energy sources such as RF and DC electric fields, chemical reactants, and a process gas. The gas manifold supplies the process gas to the plasma generator at the right flow rate and proportion. LAM RESEARCH 590 has been designed to support a variety of etch processes, such as oxide etch, oxide ash, oxide strip, and nitride ash. This is due to its broad process capability, which covers a wide range of process gases such as chlorine, NF3, and CF4and two temperature options: low (25°C) and high (90°C). The low temperature option offers higher controllability of processes. In addition, 590 is equipped with several process monitoring and control features, such as real-time auto tune, real-time Data Logging (DC< -400v), and wafer Inspection Monitoring System (WIMS). These features provide users with detailed process control and performance data. LAM RESEARCH 590 offers a reliable and consistent process for etching and patterning electronic components on material surfaces. With an RF power source up to 550W and process temperatures range up to 90°C, 590 offers excellent process control and repeatability. LAM RESEARCH 590 is also equipped with a variety of process monitoring and control options and features, enabling users to tailor the process to their specific application needs.