Used LAM RESEARCH 590 #293604302 for sale

LAM RESEARCH 590 Etcher/Asher is a dual-cassette etching equipment offering high performance and flexibility for etching and ashing processes in a wide range of applications. 590 was designed to be an efficient, cost-effective solution for organizations needing high-throughput etching and ashing in both dry and wet environments. This system is built with an intuitive software interface and can be easily integrated with automated wafer handling systems to reduce risk of human error. It is versatile, modular and customizable in the areas of temperature control, gas and venting systems, wafer material handling, and end-of-run operations and diagnostics. LAM RESEARCH 590 is a high-capacity etching and ashing unit optimized with a three-zone machine that consists of an etch zone, a clean zone, and a bake zone. The etch zone provides a rapid etching process through a loadlock tool with up to three cassettes, allowing for simultaneous etching of up to 24 wafers in a single etch cycle. The clean zone is equipped for gas oxidation to cleanly strip away the material from the surface of a wafer to be re-etched. Finally, the bake zone offers an easy-to-use baking asset with an oven-sized temperature uniformity of ±3°C. 590 also consists of a new, innovative gas management model for controlling and monitoring etch process ambient gas flows and pressure. This allows users to maintain a positive pressure boundary over the wafer within the equipment to enhance process uniformity while still allowing recycling of the etchant and process exhaust. Finally, LAM RESEARCH 590 provides both dry and wet ashing operations. This allows users to achieve perfect reproducibility in their experiments, make fast, efficient etch-back operations, or select any type of dry or wet etching process. This makes it simple to use 590 for a variety of etching and ashing operations, allowing users to make repeated test runs, quickly adjust parameters and optimize process results.