Used LAM RESEARCH 590 #9100791 for sale

LAM RESEARCH 590 is a high-performance precision etcher/asher designed to process high aspect ratio and 3D microelectronic structures. It utilizes state-of-the-art software to provide a comprehensive capability for etch and ashing applications in diverse materials and processes. 590 is suitable for industrial production due to its high throughput configurations and flexible process modules. The Chamber of LAM RESEARCH 590 is made of Ceramic and Titanium, providing chemical resistance and high-temperature tolerance. It is equipped with five electro-magnetic coils to provide a uniform DC electromagnetic field across the etching area, ensuring both uniform etching and high selectivity. The electrodes provide stable and repeatable DC bias adjustment, providing a wide range of etching depths. A LAM patented Electron-Cyclotron Resonance (ECR) Source ignites the process with a high-frequency plasma, resulting in an effective etch with high selectivity and little by-products. Its proprietary gas dynamic compressor equipment delivers low-pressure etching with uniform gas flow and radial plasma output, resulting in high resolution etching. 590 incorporates LAM's patented Computer Automated Sampling & Handling System (CASH) for efficient sample loading and plasma discrimination. The bezel Recognition Technology (BRT) for automated wafer handling and alignment ensures optimal die-level accuracy. The machine is capable of accommodating a wide range of wafer sizes, from 5mm to 7.5". The LAM Motion Control Unit (LMS) provides advanced motion control technology for LAM RESEARCH 590, allowing for rapid and accurate sample placement at throughput. The integrated automated process recipes provide efficient and reliable etching with optimal parameters. The advanced Vacuum Machine incorporates several features that provide uniform etching and reduced particle contamination. For example, the Hot-Cold-Vacuum Pumping Tool is specifically designed to prevent macro particulate contamination, while an active Backside Pressure Monitor prevents any macro-contamination to the backside of the wafer. 590 is a high throughput asset that is reliable and user-friendly. Its advanced automation and controls guarantee repeatability and high yield. With its various features, LAM RESEARCH 590 is highly effective at performing precision etching and ashing for industrial, MEMS and 3D microelectronic structures.