Used LAM RESEARCH 590 #9145838 for sale

LAM RESEARCH 590 etcher/asher is an automated, high-performance plasma etching and/or ashing equipment. It is designed to meet the demanding requirements of the most advanced semiconductor device manufacturers and can support both R&D and production applications. 590 utilizes state-of-the-art technology in a cost-effective manner to deliver superior performance and process flexibility. In terms of the hardware, LAM RESEARCH 590 consists of vacuum chambers equipped with upper and lower electrode assemblies, DC and RF power supplies, and a range of process-gas control and delivery options. The system has two distinct processing chambers: a dedicated plasma etcher chamber and a dedicated plasma ashing chamber. The etcher is equipped with a high-end RF-power generator and a proprietary electrode assembly, whereas the asher includes a directional DC-power source. The chambers are coupled with a hot-walled pumping unit, which increases process throughput and reduces overall maintenance. Additionally, the machine features a range of process-gas control and delivery options, including a timed injection tool for optimized performance. In terms of the etching process, 590 utilizes a mercury-based RF power-source asset and designed discharges to produce a highly uniform etch profile with accurate and repeatable depth control. LAM RESEARCH 590 enables precise control of the etch-rate and profiles across the entire wafer by coupling the power-source with an advanced closed-loop process-control model. This unique combination of hardware and process-control capability enables higher throughput, greater process stability, and higher etch-rates with working temperatures that are consistently well-below target temperatures. 590 also features an advanced etch-recovery equipment with automated maintenance and validation. This system allows for quick recovery from any process anomalie, with a full range of equipment and process diagnostic capabilities. Additionally, the unit includes a true closed-loop process-control machine that allows for fast and accurate process diagnostics. Overall, LAM RESEARCH 590 is a state-of-the-art etcher/asher that provides high-performance and process flexibility in a cost-effective manner. The hardware and process-control tool ensures excellent etch uniformity and repeatable depth control, while the etch-recovery asset allows for quick and accurate recovery in the case of any process anomalies. 590 is a great choice for any laboratory or production environment looking to achieve maximum process performance and efficiency.