Used LAM RESEARCH 590 #9160079 for sale

LAM RESEARCH 590 is an etcher/asher equipment primarily used for etching and ashing processes in high-volume semiconductor production. This system is comprised of a plasma source, a control panel, and a chamber. The 10-kW powered microwave plasma source allows for precise and consistent etching or ashing of materials up to a thickness of 25 µm, with a range of optionable operating pressures and processes. This unit is uniquely designed with a cryogenic, turbo-molecularly pumped atmosphere capabilities, as well as an 8-track wafer handler. The 8-track wafer handler can handle 200 wafers up to 8 inches in diameter and 15 weight up to 200 mm in diameter, enabling efficient and cost-effective loading and unloading of substrates. The control panel provides accurate, repeatable control of both etch and ashing depth with a Digital Mass Flow Controller (MFC). The controller is designed to maintain stable pressure, temperature, and flow rate for etching and ashing. The chamber is constructed with an advanced shielding machine that reduces wafer-to-plasma interference and optimizes etch/ash uniformity. The chamber also provides an inert atmosphere during etching or ashing processes, preserving the integrity of the substrate materials by efficiently controlling the environment. 590 etcher/asher tool is an advanced semiconductor processing tool with the ability to precisely etch, ash, and clean through many layers at once, enabling faster and more cost-effective production. This asset is designed for efficient use in harsh conditions, with six adjustable pressure and temperature settings for optimal process control. This model is also optimized for wafer loading and unloading, with the 8-track wafer handler which can handle 200 waferes up to 15 weight and 8 inches in diameter. LAM RESEARCH 590 etcher/asher equipment is an efficient and cost-effective semiconductor production tool.