Used LAM RESEARCH 590 #9226108 for sale

LAM RESEARCH 590
Manufacturer
LAM RESEARCH
Model
590
ID: 9226108
Wafer Size: 6"
Oxide etcher, 6".
LAM RESEARCH 590 Etcher/Asher is a multi-purpose deposition tool for etching and depositing material for surface coating and modification. It uses a patented plasma-generating 'diamond window' technology to create precise etches, allowing users to design and shape metal surfaces to precise specifications. It is designed to provide a cost-effective solution to handling complex surface modification tasks while maintaining high throughput and precise accuracy. 590 features a compact size that allows it to fit in both lab and manufacturing environments. It offers precise and repeatable deposition processes, facilitating both high-precision surface modification and topographical tuning. Its main features include pressure and temperature control, easy adjustment of the etch rate and layer thickness, quick-changeable nozzle sizes and a variety of compatible process gases. LAM RESEARCH 590 is equipped with a high-performance gas system, optimized exclusively for high-performance processing, capable of supporting multiple gas sources and delivery systems. The etcher is capable of etching high purity materials, as well as metals with different blend profiles, such as stainless steel and aluminum. 590 also features a high-resolution multi-view optics system that allows for fast, accurate detection of deposition progress, eliminating the need for sample evaluation. LAM RESEARCH 590 is designed to provide easy maintenance and flexibility through the use of integrated diagnostic and control systems. The system is equipped with a multi-zone wafer chuck with digital heaters, a high-velocity furnace and programmable digital logic for process and component control. Moreover, its advanced software architecture allows for process control and optimization to ensure repeatable and reliable performance. A unique feature of 590 is its ability to move the substrate table while etching and deposition processes are taking place. This allows users to accurately evaluate the results of a process and adjust the parameters as needed in real time. Additionally, it is designed to provide a low cost of ownership, allowing users to realize cost savings from reduced capital investments, operations costs, and maintenance.
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