Used LAM RESEARCH 590 #9226292 for sale

LAM RESEARCH 590 is an etcher/asher equipment designed for silicon wafer patterning and select applications requiring Etch and Ashing capability. This etch-and-ash system delivers the accuracy and repeatability of batch processing with the flexibility of single wafer processing. It features a uniform gas flow, chamber volume and low temperature throughout the entire chamber, which results in improved deposition rate accuracy and better product yields. The unit also offers an advanced gas delivery machine that allows for minimal gas consumption per process. This tool also offers a high-performance RF generator with full programmability for fast and reliable processes. Its an enhanced Source/Drain hardmask etch chamber is optimized for single wafer etching and provides ultra-high-rate etching along with low ICP pressure. With the source to drain etch chamber, the asset offers a wide range of process temperatures and power levels to meet various requirements. Moreover, 590 can be configured with additional chambers and different etch process capabilities such as sputter cleaning, plasma etching and sub-surface etching. This model gives you the flexibility to customize the process according to your needs. In addition, LAM RESEARCH 590 helps you to reduce your cost of ownership and make the process much smoother at lower operational costs. Its advanced control options and intuitive GUI interface provides the user with a complete solution for their patterning and etching needs. All in all, 590 is an industry-leading etch-and-ash equipment which provides ultimate precision and process control.