Used LAM RESEARCH 590 #9275402 for sale

LAM RESEARCH 590 is an advanced etching equipment that is ideal for dielectric, metal and oxide applications. This system is designed to provide users with a reliable and efficient etching process that is suitable for both batch and inline production. With superior process performance, 590 can be used to etch a wide variety of materials including glass, silicon and metals. LAM RESEARCH 590 has a robust process chamber which is designed to handle a range of process pressures and temperatures. This unit comes with a large, integrated source plate configuration which is ideal for precision control of etch rates. Built-in process algorithms and process optimization capabilities provide users with the ability to adjust process parameters on a real-time basis. The machine includes an advanced user interface which can be used to configure recipes, enter process parameters and monitor etching progress. 590 is equipped with a high-powered HF RF generator which is capable of delivering up to 350W of power to etch target materials. A unique dual-view optical tool is used to monitor etch rate at the target material interface, while a gas flow asset provides precise control of gas delivery and process flow. This model is designed to offer the highest level of process repeatability with an integrated precision control of both etching and deposition rate. LAM RESEARCH 590 offers enhanced uniformity for dielectric and metal deposition, which helps to provide defect-free devices. This equipment features a low temperature load lock which minimizes particle generation and capitalizes on process throughput. With its advanced process control and process optimization features, 590 is an ideal system for etching and deposition of dielectric, metal and oxide materials.