Used LAM RESEARCH 594 #9308907 for sale

LAM RESEARCH 594 etcher/asher is a large-scale production equipment used in semiconductor processing for etching shallow trenches, contact pits, or vias. The system has a robust, open-frame design which provides less frequent maintenance and a longer lifetime of operation. The tool consists of two modules, a bulk-only etching chamber and an ashing module. It also features a customizable hardware and software architecture. The bulk-only ion source in the etching module provides a high-energy, monospecific ion beam with up to 40 kHz pulse repetition rate and 10% minimum duty cycle. With this unit, users can etch shallow trenches, contacts, and vias through both standard and advanced masking layers, all the way down to a sub-20nm resolution. The manual plasma process for the etching module comes with Smart Ion Source Controlling (SmartISC) technology, which allows the user to adjust the ion beam characteristics according to the etching profile. The ashing module of 594 provides a selectivity as high as 20:1 between silicon and photoresist. It uses a low-power vertical linear inductive RF source with low-pressure plasma to quickly clean the bottom of deep trenches and trenches with tight aspect ratios. The vertical source also ensures sidewall passivation of the etched patterns in contact pits and trenches. In addition, LAM RESEARCH 594 provides excellent process repeatability thanks to its advanced automation features. The automated thermal-assisted showerhead with a variable angle of incidence is designed to ensure process reproducibility between batches, and it can also be used for etch profiling of contact pits. As a result, 594 is an outstanding tool for deep substrates and high-aspect ratio etching, and it has become a popular choice among chip designers and semiconductor fabricators. With its innovative machine, LAM RESEARCH 594 is capable of delivering high-performance, cost-effective etching operations.