Used LAM RESEARCH 715-440264-003 #293661555 for sale

LAM RESEARCH 715-440264-003 is an etcher / asher, a type of semiconductor device used for etching or ashing of dielectrics, metals and other materials on a substrate. It is an open tube etcher / asher designed for chemical processes requiring multimode operation, such as dry etching, resist ashing, wet stripping and plasma etching. This asher / etcher features a plasma source consisting of a proprietary RF source and LAM patented adjustable flow pattern adjustment technology. This technology enables exact adjustment and precise control of the etch process, providing a wide range of process control options. This flexibility is essential to achieve the desired etching results. The vacuum equipment of 715-440264-003 is designed to provide exceptional etch rate control with a wide range of process gas contaminants. The vacuum system helps to minimize particulates and etch byproducts, enabling precise control and cleaner substrates. Additionally, its clean-branded model provides the option of using higher plasma source temperatures in order to generate the best etching results. LAM RESEARCH 715-440264-003 also offers an advanced thermal unit for precise temperature control. Its custom built integrated high temperature oven ensures temperature uniformity across the entire substrate for precise control. Its unique, Variable Temperature Substrate Holder (VTOSH) offers the ability to precisely modify the temperature of any part of the substrate, offering greater flexibility and finer temperature control for specialized processes. 715-440264-003 has several options for interchangeable gas equipment including RF multipole gas injectors for controlled gas introduction and delivery and inert gas sensor for monitoring the chamber's environment. The optional multiport exhaust machine allows controlled exhaust of process gasses and byproducts, ensuring optimum contamination control. This asher / etcher can also be equipped with an instruction process display for automated set-up and corrections, allowing the operator to monitor the etching process for improved accuracy. Its advanced operator interface and comprehensive documentation makes it a suitable etcher / asher for basic and advanced operators. LAM RESEARCH 715-440264-003 is an advanced asher / etcher with a wide range of features designed to deliver precise etch results. Its Variable Temperature Substrate Holder, multiport exhaust tool and process display allows for improved process control and adjustment for specialized processes. Its advanced thermal asset and RF source enable precise temperature control and higher plasma source temperature. With its various interchangeable gas equipment, 715-440264-003 is a suitable asher / etcher for basic and advanced users.