Used LAM RESEARCH 790 #9088929 for sale

LAM RESEARCH 790 is an etcher/asher equipment designed to accommodate wafer processing of all types. It is suitable for producing high quality, precise and repeatable results on all types of semiconductor wafers and dielectric films. 790 is equipped with state-of-the-art technologies including multiple radio-frequency (RF) power sources for precise etching, as well as multiple vacuum chambers, enabling each wafer to be processed with consistent accuracy at high throughput. The system consists of an environmental chamber which incorporates the processing chamber, vacuum and loading/unloading stations. It also comes with a variety of optional tools and an integrated controller to tailor the unit to specific applications, including low-k dielectric processing, nitridation, chemical/mechanical planarization, oxide stripping, and selective etching. The RF power source provides the necessary etching performance for a wide range of applications such as oxide and polysilicon etching, nitridation, removal of photoresist and other contaminants, and damage anneal of diffusion areas. The power source is designed to provide high precision and stability, allowing for precise control over etch-depth and etch-rate of processes. This is further aided by the ability of the machine to orient the wafer by rotating it during processing. The vacuum tool employs advanced technology to provide high-flow rate, low-pressure gas attaining deep vacuum. This ensures a low-cost, uniform plasma etch with repeatable process results. The load lock portals and loader/unloader modules provide high speed, wafer transport while maintaining a clean environment and enabling optimal productivity. LAM RESEARCH 790 asset is ultra-efficient, featuring dual-bus architecture with high-power linear supplies for maximum output. It also comes with an intuitive user interface and is compliant with industry standards, making it easy to operate and maintain. Highly reliable and efficient, 790 etcher/asher is a reliable and highly cost effective solution for precise and repeatable etching and ashing on all types of semiconductor wafers and dielectric films. Its advanced RF power source and high-flow rate vacuum model can provide reliable, repeatable process results with minimal operator intervention, ensuring process integrity and optimal throughput.