Used LAM RESEARCH 832-038915-101 #9363371 for sale

LAM RESEARCH 832-038915-101 is a wet bench etcher/asher equipment designed for use in large-scale wafer fabrication processes. It is capable of etching/ashing wafers made of substrate materials such as silicon, gallium nitride, and molybdenum. The system can etch/ash uniform patterns over the entire wafer surface, and achieve cornering accuracy of 0.6 um or better for pattern pitch of 25 um and larger. The unit is composed of several key components, including an RF power generator, RF power conditioning components, a high-speed RF sputtering chamber, multiple fluidic ports, and a high-resolution precision gas distributor. The RF power generator is used to provide power for the sputtering process, and can operate at voltages of up to 4 kV and frequencies up to 1 MHz. The RF conditioning components ensure that the power delivered to the chamber is stable throughout the etching/ashing process. The RF sputtering chamber enables high-speed etching/ashing, and is capable of handling wafers up to 12" in diameter. Inside the chamber, a high-resolution gas distributor ensures uniform flow of etch/ash gas throughout the etching/ashing process. Additionally, the gas distributor adds flexibility to the machine, allowing users to adjust the flow and composition of the etch/ash gas as required. The fluidic ports enable communication between the etcher/asher tool and any externally-controlled liquid or dry etch/ash systems. The ports also allow for the introduction of reactive gases, such as O2, NH3, or Cl2, and enable the reuse of etch/ash chemicals. Finally, 832-038915-101 utilizes special materials designed to provide superior etch/ash quality, and features a low-maintenance design with minimal downtime. Additionally, the asset supports process monitoring on a centralized platform, allowing for easier process control and improved throughput.