Used LAM RESEARCH 839-019080-611/A #293658874 for sale

ID: 293658874
Electrostatic Chuck (ESC).
LAM RESEARCH 839-019080-611/A is an advanced etcher/asher which provides precise and consistent removal of etchants and other materials from surfaces in order to achieve ultra-precision patterning demands for the semiconductor packaging and high-density interconnect industries. This highly advanced etcher/asher features a state of the art dual stacked etch and asher cooling equipment to ensure uniform processing temperatures resulting in highly uniform break out patterns, superior yields, high aspect ratios, and improved uniformity. The dual stack cooling system utilizes a reverse flow design to ensure optimal performance and repeatable results. The unit also includes an advanced degas-and-etch technology to simplify the process of ashing material while maintaining a low particle count. LAM RESEARCH 839-019080-611/A features high-speed, adaptive precision etch-and-ash processing capabilities with an integrated gas distribution and exhaust machine that provides for a fast process cycle time, minimal etch undercutting, and uniform etch/ash rates. With a wide range of etch chemistries supported, it provides superior processes for smaller features and high aspect ratio features, which requires processes that run within 5 nanometers of feature edges. LAM RESEARCH 839-019080-611/A also includes a feature-enhancing anneal cycle within the etch process to lessen wicking and undercut of features. An advanced network controller allows for dynamic control over the etching process for tight control over run-count, etch rate, ash rate, temperature, and analytical techniques to monitor conditions on the fly. The 839 series also includes dynamic safety protocols to ensure continued safe operation. It features an advanced reactive ion etch (RIE) tool that offers tight control over plasma densities, power, and substrate temperature for precise etching of engineered materials. It also has an automated pressure-vacuum cycle that keeps the reaction chamber at 'as new' cleanliness levels. The open architecture allows for easy integration into existing manufacturing lines, and the asset is easily upgradable for future expansion and integration. The user interface offers easy navigation and complete control over the etch-and-ash process. LAM RESEARCH 839-019080-611/A offers the speed and precision needed for etch/ash requirements in the most demanding processes.
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