Used LAM RESEARCH 839-019090-328 #293655211 for sale

LAM RESEARCH 839-019090-328 is a state-of-the-art etcher (or asher) that is used to etch or chemically etch materials, such as silicon, metal, and other hard materials. It is designed to be highly cost effective and reliable. It is an etcher designed for high quality materials processing, with the ability to etch accurately and faster than other etching systems. This equipment is composed of an electron beam source that is enclosed in a vacuum cabinet. The electron beam provides the etching process by driving electrons into the material at high energy and producing variations in the material surface topography. It can be operated in batch mode, as well as in continuous mode. 839-019090-328 is a versatile system, able to handle many different etching processes. It can be used to etch a variety of materials, including semiconductors, metals, and polymers. This etcher is capable of etching a variety of features and structures, including etched circuitry, contact points, trenches, grooves, through-holes, and other geometric patterns. It has a large etching area, up to 12" x 12", and can be configured to etch both patterned and unpatterned substrates. The unit is designed to provide accurate etch depth control, uniformity, and repeatability in a wide range of materials. LAM RESEARCH 839-019090-328 is designed with an easy-to-use graphical user interface (GUI) for intuitive control and monitoring of etching processes. The machine is also equipped with diagnostic and data acquisition capabilities, providing feedback on process conditions. Additionally, it is integrated with a state-of-the-art Personal Digital Assistant (PDA) software, which allows for real-time process control while the tool is running. 839-019090-328 is ideal for applications requiring precision and repeatability. It is a reliable and cost effective etching asset for a wide range of etching processes. It is a powerful, high-yield, and flexible etcher, with excellent operational reliability and repeatability.