Used LAM RESEARCH 839-019090-577 #293670008 for sale

LAM RESEARCH 839-019090-577 is a chemically assisted reactive ion etcher designed for etching advanced materials for enhanced device production. It features efficient ultra-low power operation with laminated quartz equipment walls, allowing for excellent performance at a fraction of the cost of other etch solutions. It is designed to perform etching operations within a wide range of process parameters, ranging from low pressure (from 1.5-2.5 Torr) to high pressure (maximum 30 Torr). 839-019090-577 is also equipped with a multi-zone chemistry delivery system that allows for the delivery of precise materials deposition, while still maintaining the ability to instantly adapt to varying process conditions. The etcher also features a plasma propulsion unit, allowing for rapid etching throughput and super-high plasma density. This coupled with the high-pressure operation, allows for highly precise control of etching processes, reducing the complexity of changing plasma and chemistry parameters. Additionally, LAM RESEARCH 839-019090-577 offers a wide range of accessories, such as different sized quartz pieces, heat shields, and wafer carriers. Process parameters such as contact and etch time, etch pressure, and plasma reactant flow rate and composition can be easily adjusted to allow for a wide range of substrate materials to be etched, with excellent uniformity and repeatability. Etching performance is also achieved with maximum etch uniformity and repeatability, even after long process times. 839-019090-577 is an ideal choice for advanced materials etching applications such as high-aspect ratio contact holes, device via holes, and trench etching. An automated set up process ensures rapid and easy setup of the etcher without causing any damage to the delicate quartz systems. LAM RESEARCH 839-019090-577 is ideal for a variety of advanced etching applications, providing excellent performance at a fraction of the cost of other etch solutions available in the market. Its high-pressure operation, coupled with the precision of its multi-zone chemistry delivery machine, makes it a reliable choice for etching processes that require quick turnaround, uniformity, and accuracy.