Used LAM RESEARCH 852-011061-103 #293661544 for sale
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ID: 293661544
Lower chamber assembly
Part number / Description
715-011665-004 / Cap, lower electrode, 4”
716-011624-001 / Ring, ceramic
716-011570-001 / Filler, orifice, W/C, ceramic
715-011035-001 / Plate, lower end (Reaction chamber)
716-011623-001 / Ring, clamp
853-013540-002 / Heated chamber manifold assembly
853-025103-003 / Lower match box assembly.
LAM RESEARCH 852-011061-103 is an etcher / asher equipment designed for production processes. The system is capable of handling a wide range of chemistries for a range of applications, including oxide etching, photoresist stripping, and plasma cleaning. 852-011061-103 has a dedicated loading arm and operates with a single process chamber, which allows for efficient and simultaneous processing of multiple wafers. The unit is designed to offer tight process control and is capable of achieving precise etching profiles with a high degree of repeatability. To ensure precise process results, the machine features a range of high-precision motion control systems including a mechanical vision tool for registration and a fly-by-eye component positioning asset. The model is equipped with an automatic loading/unloading station and comes standard with an inline loader, allowing for continuous operation without the need for manual handling of components. The equipment is also equipped with a temperature control system to hold optimum temperature at the process chamber lid and maintains stability during operation. Additionally, it features a particle-monitoring unit to detect any particles or contaminants that may be present. LAM RESEARCH 852-011061-103 is built with an enclosed etcher chamber and features a low-temperature, low-power vacuum. This vacuum is capable of a deep-etching process and a high-conformal-etching process, which allows for plasma etching with high selectivity and precise features. The machine also features a wide range of auto-switching gas systems, which can be used to automatically switch between multiple gas sources for different steps in the production process. In addition, 852-011061-103 features pressure control systems and a pressure control monitor to check the stability of the plasma during processing, ensuring a safe and reliable etch. This tool is also designed with a user-friendly graphical user interface, allowing users to set parameters, define recipes, and monitor the asset's performance from a safe distance. LAM RESEARCH 852-011061-103 is a reliable and efficient etching model designed to provide industry-standard results. With its robust design, precise control, and wide range of features, this equipment is the perfect choice for any production process requiring a high degree of accuracy and repeatability.
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