Used LAM RESEARCH 853-012123-001-G-230D #9143212 for sale

LAM RESEARCH 853-012123-001-G-230D is an advanced etching equipment designed for wafer processing and device fabrication. It uses a combination of chemistry, laser, and thermal technologies to etch or pattern wafers, including custom-patterned layers, multiple layers, and thick films. 853-012123-001-G-230D system is capable of patterning 100-500mm wafers. It features a high-precision optical unit for accurate alignment of wafers and photoresist layers. The architecture is designed to deliver low-cost and reliable etching and annealing processes while still having the capability to match the process requirements of numerous applications. The primary etching and annealing function of LAM RESEARCH 853-012123-001-G-230D is an advanced laser-shielding technology. This machine is engineered to allow for laser and thermal protection from the high-energy beams used to etch and anneal, while still providing the necessary wafer patterning. To ensure accurate patterning of each layer, the tool has a precise optical asset that allows for ball-tracking and alignment. Additionally, the model is designed to improve process uniformity and offers both electrostatic and magnetic fields for better control over wafer patterns and materials. For the etching process itself, 853-012123-001-G-230D utilizes two separate technologies. The first is a wet etching process, where chemicals are used to pattern the wafer surface. The second is a dry etching process, where a gaseous plasma is used to etch the surface. This allows for higher levels of patterning accuracy and speed compared to traditional etching methods. Additionally, the equipment features temperature control to enhance the etching process. To reduce the risk of contamination from particles, LAM RESEARCH 853-012123-001-G-230D system has a dedicated filtration unit. This machine reduces the amount of airborne particles and dust that can enter the tool. Additionally, the etching asset has integrated monitoring systems that allow operators to better monitor the etching process and ensure quality and accuracy. Finally, the model has a powerful cooling equipment to protect its components from the high temperatures generated during processing. Overall, 853-012123-001-G-230D system is designed to provide high-accuracy surface etching and annealing of wafers. It features a range of advanced technologies, powerful filtration and cooling systems, and dedicated monitoring capabilities to ensure maximum process accuracy and reliability.