Used LAM RESEARCH 853-025083-001 #293641757 for sale

LAM RESEARCH 853-025083-001 is an etcher/asher used in semiconductor device fabrication. It is a multi-chamber, high-density plasma etcher capable of patterning a variety of substrate materials. 853-025083-001 features four processing chambers equipped with independent radio frequency sources, allowing for simultaneous etching in each chamber. Each chamber is capable of producing high-density plasma to quickly process wafers. LAM RESEARCH 853-025083-001 offers convenient maintenance access, via a bi-directional front loadlock chamber. Additionally, its new gas delivery equipment produces accurate gas flow for precise etching parameters. 853-025083-001 is an advanced etching system, with integrated edge biasing technology which minimizes the plasma etch profiles. Its modified RF ionizer provides high-density plasma for uniform etch rates across the wafer. The Plasmalab® powered source management provides flexibility to alter etching parameters between substrates for optimized etch results. The co-axial shower head design stirs the ionized gas for uniform etching results. Moreover, two-dimensional process state verification unit, real-time endpoint detection, and temperature control improve the machine performance. LAM RESEARCH 853-025083-001 includes an automated computer interface which can be used to store data, review results, optimize process parameters and quickly alter group recipes or transfer from one tool to another. 853-025083-001 is built with safety features, including a floating interlock tool and process-safe housing design which protect personnel and the environment from hazardous plasmas and hazardous materials. LAM RESEARCH 853-025083-001 is an advanced etching asset designed for use in wafer fabrication and semiconductor device production. It is equipped with features that provide uniform etch results while minimizing the plasma etch profiles during etching. Additionally, its automated computer interface allows the user to quickly store data, review results, and optimize process parameters. Its safety features also protect personnel and the environment for hazardous substances.