Used LAM RESEARCH 9400 DFM #293764229 for sale

LAM RESEARCH 9400 DFM is a wet process etching/ashing equipment designed for semiconductor device manufacturing. It features a full suite of advanced technologies designed to provide increased process performance, low total ownership cost, low contamination, and improved safety. 9400 DFM system is composed of a modular design and is customizable to feature a broad range of technologies and process applications. The unit includes fully integrated imaging, temperature control, monitoring, and mass flow controllers (MFCs). Together, these components enable a consistent deposition rate, ensuring high-quality, repeatable etching/ashing. LAM RESEARCH 9400 DFM's multi-zone design allows for optimal thermal control at each stage of the process. DFM also includes a unique feature that allows for the simultaneous development of multiple chambers and rapid cycle times. 9400 DFM machine features a dual vapor delivery tool that allows for a higher etch selectivity, improved uniformity, and improved process performance. The asset also includes a dedicated wafer heater allowing for improved temperature control over the wafer surface, which is critical for producing high-quality, advanced process devices. The model also includes a window wafer ester port for optional etch chemistry delivery and an optional hydrogen anode for improved isotropic etching. LAM RESEARCH 9400 DFM's platform includes a 3800 controller equipment and a suite of modules for process automation, ensuring reproducible processes and traceable data. The process recipes can be stored in a database, accessed remotely, and controlled direct from the system's OPC service. 9400 DFM is engineered with in-situ cleaning and over-pressure protection technology to reduce the potential for plasma-induced particle contamination, further enhancing process performance. In conclusion, LAM RESEARCH 9400 DFM is designed for high performance and is an ideal solution for the manufacture of advanced device and microelectronic processes. It provides users with flexible configuration, optimized temperature control, integrated imaging, user-friendly parameters, fast cycle times, advanced process automation, and impurity protection.