Used LAM RESEARCH 9400 SE #293799084 for sale

LAM RESEARCH 9400 SE is a high-performance, cost-effective etcher/asher that is ideal for semiconductor manufacturing applications. With its advanced plasma dry etch and asher technology, it offers the highest yield and maximum production throughput for advanced product development and process optimization. The advanced technology enables precise control of the process variables, resulting in superior product performance. Included are two separate chambers, one with a dual-frequency induction coil and one with a dual frequency radio frequency coil, along with Automatic Refill Technology capabilities. The integrated equipment helps the user to reduce overall costs by offering precise etching parameters, shortening the time-to-market of complex products. The large, 15 inch, low temperature touch panel screen offers complete edge-to-edge visibility and simplifies data records. LAM RESEARCH 9400SE provides a large chamber capacity of 15.6 liters with a choice of three different sized etch chambers - 6, 7 and 8 inch. This allows high etching rates in high temperature etching environments. The integrated, in-situ end point detector module ensures process uniformity and repeatability. The etch system design ensures exceptionally fast cooling rates and sub-micron feature resolution. This helps save valuable time and increases productivity. It also has excellent uniformity performance across all wafer sizes and chamber configurations. Additionally, the unit includes a wafer susceptor autoloader and two wafer transfer mechanisms for efficient handling of multiple wafer batches. 9400 SE offers huge process flexibility and accuracy for numerous etch applications. These applications include etching deep DRC/sub-0.25µm view, via routes, threshold logic layers, and dielectric layers for advanced packaging and high frequency RF devices. It also provides advanced features such as enhanced chemical control, multi-step etching, and advanced process integration and control, all in a single unit. The machine design helps optimize chamber evacuation, reducing etching time by up to 50% over standard etch systems. 9400SE offers corrosion-resistant stainless steel chamber walls, flexible support plate designs, and precision alignment of quartz shields and susceptors. This ensures an optimized process environment with minimal downtime and maintenance cost. Overall, the advanced technology of LAM RESEARCH 9400 SE etch/asher optimizes design trade-offs to provide the maximum performance and reliability for cost-sensitive and fast-paced semiconductor fabrication processes. The unit provides high productivity, superior reliability, and low consumable costs for maximum cost savings.