Used LAM RESEARCH 9400 #293814136 for sale

LAM RESEARCH 9400 is a highly advanced etcher/asher equipment that allows for a wide range of advanced etching and ashing processes. The system utilizes an advanced beveled wafer chamber design with a wide range of on-board etching and ashing technologies that enable fast and accurate etch/ash processes. The unit is equipped with a quartz crystal microbalances (QCM) for excellent accuracy, fast rates, optimum uniformity and yield. The machine features a sophisticated PC based controller for fast and reliable job control, with a range of process recipes for various parameters. The tool is designed to process a range of sizes from 2" to 200mm, with up to 100 wafers at a time. The asset utilizes an array of advanced accessories, such as dedicated metrology tooling, for improved process results. 9400 etcher/asher can be used to perform a variety of etch/ash processes, such as dry etching and directional etching, enabling high aspect ratio fill and contact holes as well as double-side processing processes. The model is suited for a wide range of wafer and mask materials, enabling improved efficiency and greater throughput. It is also highly scalable, allowing for both batch-based and single wafer etch/ash processing to be performed, enabling cost effective solutions. The equipment can be equipped with additional gas sources and unique multiple stage processes, allowing for optimal manufacturing of complex devices. LAM RESEARCH 9400 is supported by the MARK 5500 software, a powerful and intuitive software platform which, combined with the PC based Job Manager, enables fast and easy parameter input, optimization and process control. The integrated software also provides pre-defined etch/ash recipes for various applications, as well as access to advanced material databases. The system is further supported with a range of post-processing features, such as oxide planarization and passivation, to ensure maximum process reproducibility. Overall, 9400 is an advanced etcher/asher unit that is designed for high-performance applications. The machine offers a robust and highly accurate etch/ash process, optimized for a range of substrates and applications. With its comprehensive support software and advanced process tools, the tool is an ideal choice for both research and production environments.