Used LAM RESEARCH 9400 #9152576 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

Manufacturer
LAM RESEARCH
Model
9400
ID: 9152576
Wafer Size: 4"
Etcher, 4" Turbo pump: STP A2203C2 Gate Valve: VAT65 VAT Controller: PM7 Chamber manometer: 0.1Torr, 629A-13799 Turbo manometer: 10 Torr, 925A117DE Roughing valve manometer: 10 Torr, 925A117DE He manometer: 0-100 Torr He UPC: 50sccm Gas: He 50sccm FC7700C Gas: Ar 50sccm FC7700C Gas: Cl2 50sccm FC7800C Gas: Bcl3 50sccm FC7800C Gas: O2 50sccm FC7700C Gas: CF4 50sccm FC7700C Gas: N2 2SLM FC7700C Software: Envision.
LAM RESEARCH 9400 etcher/aser is a full turnkey dry process equipment solution for etching, ashing and cleaning integrated circuit (IC) substrates. 9400 utilizes high speed, chemical reaction-driven processing for improved throughput, accuracy and reliability. LAM RESEARCH 9400 has a modular platform design with high temperature capabilities, providing consistent performance for a variety of etching and ashing applications. 9400 is designed for high throughput applications and is one of the most widely used etchers in the industry. LAM RESEARCH 9400's cutting edge modular architecture allows for maximum process flexibility and customized configurations for specific applications. Standard configuration includes a processing chamber, loadlock, process gas management, a process fill/drain system and a load manipulator. Additionally, 9400 features the latest process automation, maintenance, and control systems to ensure accurate, reliable and repeatable operations. LAM RESEARCH 9400 offers ultra-high speed etching and ashing of advanced, ultra-thin Membrane and II-VI (MIV) dielectric materials, as well as accurate etching of multi-layer dielectric, metal and via layers. It has a large etch area that offers high throughput, quick turn between jobs and fast processing times. 9400 also offers multiple etch processes including CF4, CF4/O2, CHF3/CF4, CHF3/O2, N2O, and others, making it an excellent choice for advanced industry applications. LAM RESEARCH 9400 is equipped with three separate reaction chambers as standard, a process and extract chamber, as well as a wet-etching chamber and irradiation chamber. Additionally, a high-power oxy/acetylene source is available for high-temperature processing. 9400 is designed for highest precision etching and ashing with improved reliability and repeatability. It offers a high degree of process control, including the ability to adjust etch time by wafer diameter and to adjust gas flows at the substrate level. It is also capable of performing patterned and bulk etches of photoresist, metal, and dielectric layers. LAM RESEARCH 9400 can process substrates up to 300mm in size and is one of the most advanced etchers available today. Its high speed, precise performance and modular architecture make it an ideal choice for a variety of wafer processing applications, including MEMS, LED, LED packaging and semiconductor device production.
There are no reviews yet