Used LAM RESEARCH 9500 #9399062 for sale

LAM RESEARCH 9500 is an advanced etcher or asher equipment that utilizes a Plasma Enhanced Chemical Vapor Deposition (PECVD) process to etch and deposit films. This system is highly capable of generating advanced films at high throughput rates, making it ideal for high-volume production needs. 9500 PECVD unit offers a wide operating temperature range extending from room temperature to high temperatures of up to 500°C. It also has an excellent process uniformity, providing the capability of consistent film thickness levels with uniform deposition rates. This machine offers high-rate deposition processes, enabling the deposition of films at fast throughput rates. The chamber of LAM RESEARCH 9500 is built with a dual-zone construction, allowing the operator to control the etching and deposition processes independently. It is also equipped with two plasma sources, a low-frequency ECR (Electron Cyclotron Resonance) and a high-frequency RF (Radio-Frequency). The dual plasma sources offer more etch power, providing the capability of etching and depositing films at higher rates. 9500 PECVD tool also provides wide substrate compatibility, allowing operation on a variety of substrate surfaces such as aluminum, glass, ceramic and silicon wafers. Additionally, the function module offers an extensive array of features, including high wafer throughput, an auto-pilot feature for easy operation, and a security level lockdown allowing only screened authenticated users access to asset functions. To ensure safety, LAM RESEARCH 9500 is designed with a multi-processor controller with multiple layers of protection. It also features an isolated vacuum chamber, preventing the possibility of hazardous chemicals from leaking outside of the model. Furthermore, the equipment has stringent pressure level and temperature control for optimal performance and to reduce the risk of damage and contamination. Overall, 9500 is an advanced etcher/asher system with a dual-zone design and dual plasma sources, making it ideal for high-volume production needs. With its feature packed operation module and stringent safety protocols, this unit is an excellent choice for etching and depositing films at rapid throughput rates.