Used LAM RESEARCH 9600 #9191115 for sale

LAM RESEARCH 9600 is an etcher/asher that is used to etch conductive material layers on the surface of semiconductor substrates. The device is capable of etching material layers with a maximum thickness of 300 angstroms. 9600 is a reliable and robust equipment that offers high precision and repeatability. LAM RESEARCH 9600 is equipped with a pulsed inductively-coupled plasma source, which has a by-product gas of argon and oxygen to allow for etching of silicon oxide and polysilicon layers. This device includes a remote process control with graphical user interface to enable easy operation, as well as a real-time monitoring and diagnosis system to provide on-line support. In addition, 9600 features an electrostatic chuck to improve reliability and accuracy by eliminating particles and other contaminants during the etching process. It also has an independent ground circuit which is used to reduce the effect of external electrical noise, allowing for precise etching of layers with sensitive features. LAM RESEARCH 9600 includes a dual-turntable unit with a maximum substrate size of 300 mm x 300 mm. The asher offers a full temperature balance with a maximum substrate temperature of 40°C. It also offers a one pass profile processing with a low substrate-to-substrate temperature variation of ±2°C. 9600 is designed for operation in a clean room environment and requires electrical power of 208V AC (12kVA) and a purge gas connection for the lower pedestal. The installation of the machine is easy because it only requires to be leveled, and the robot stages, (Vertical and Horizontal Robot) have to be calibrated. It is important to periodically clean the chambers and the substrate holders, including the lower pedestal and outlets. This ensures that the dust particles produced during the etching process do not degrade the substrate quality and caused unacceptable defects in the produced layers. Overall, LAM RESEARCH 9600 is a reliable and versatile etcher/asher suitable for etching layers with a thickness of up to 300 angstroms. This device features an impressive level of precision, an easy to use graphical user interface, and a dual-turntable tool which can accommodate substrates of up to 300 mm x 300 mm. 9600 is ideal for clean room environments, and the proper cleaning of the chambers and the substrate holders must be done regularly to ensure optimal results.