Used LAM RESEARCH A4 4520 PM #9170252 for sale

LAM RESEARCH A4 4520 PM
ID: 9170252
Wafer Size: 8"
Vintage: 1996
Etcher, 8" 1996 vintage.
LAM RESEARCH A4 4520 PM is an etcher (or asher) designed for advanced processes, providing precise control over the material removal process. It has a final pass rate of up to 10,000 wafers per hour, and is designed to create small, ultra-precise features with precise, repeatable results. For maximum process flexibility, A4 4520 PM is equipped with an advanced wafer-handling equipment that adjusts to any substrate. This includes components for handling wafers with various diameters and thicknesses, as well as a programmable chuck-prioritization system for accurate management of multiple wafer sets. A variety of features are available to maximize etching quality and process yield, including a closed-loop vacuum chuck design for precise temperature control, detailed real-time process monitoring using high-quality, visible optics, and multi-level, automated recipe-based gas control. The unit's patented Rapid Energy Response technology adjusts to processing various materials and substrates at optimal speed, minimizing reactant concentration during the etching process for improved etch rate and quality. Additionally, LAM RESEARCH A4 4520 PM is equipped with advanced gas control for precise material removal. The machine also includes a troubleshooting feature, allowing technicians to quickly identify and solve problems during the process. Furthermore, integrated reporting capabilities allow etch parameters from every wafer to be recorded and reported for traceability and performance history. To maximize safety, the tool includes an advanced containment asset to protect personnel and equipment from any hazardous materials used during etch processing. This includes a powerful gas scrubber for trapping and removing etchant outflows. Overall, A4 4520 PM is a reliable, advanced etcher designed for creating accurate, repeatable features. It offers maximum process flexibility, precise temperature management, gas control, and an effective containment model for enhanced safety.
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