Used LAM RESEARCH A6 9608 PTX #9410070 for sale

LAM RESEARCH A6 9608 PTX is an advanced plasma etcher / asher, with superior performance and capabilities to support modern etching / ashing requirements. It is a large-scale, multi-chamber equipment equipped with advanced High-Velocity Ionized Flow (HVIF) technology, and is able to clean substrates of various sizes in multiple processing chambers. A6 9608 PTX features a new generation plasma source technology that uses high frequency and high power to create a stable and uniform plasma torch. This advanced technology enables high etching / ashing precision with low damage and superior etch / ash uniformity. The control system can also automatically adjust the plasma torch power and repeatability for increased process repeatability and performance accuracy. LAM RESEARCH A6 9608 PTX is equipped with a multi-zone gas delivery unit, which allows for a precise control of the etching / ashing reaction. The multi-zone gas delivery machine allows the user to adjust the chamber settings, such as pressure, temperature, and flow, to adjust the etching / ashing reaction to meet process requirements. A6 9608 PTX is also capable of supporting a wide range of gas types, such as CF4 (tetrafluoromethane), C3F6 (hexafluoroethane), and other gas mixtures, making it suitable for most etching / ashing applications. The tool is also equipped with a special wafer cleaning asset that can handle both semiconductor and non-semiconductor materials. This model is designed to prepare the substrates prior to the etching / ashing process by removing unwanted materials and particles from the substrates. LAM RESEARCH A6 9608 PTX is designed to provide a superior level of control and precision during the etching / ashing process. It is equipped with a wide range of automated control systems to ensure precise and repeatable process conditions. The equipment's comprehensive software interface allows users to observe the etching / ashing performance parameters and monitor the process from remote locations. A6 9608 PTX is designed for easy integration with other LAM RESEARCH tools, such as pre-processing and post-processing systems. It also allows users to configure multiple process recipes and process settings for various etching / ashing applications. The system is also capable of storing extensive process data, allowing users to track the etching / ashing performance parameters and experiment with different recipes. Overall, LAM RESEARCH A6 9608 PTX is an advanced plasma etcher / asher, with superior performance and capabilities to support modern etching / ashing requirements. It is equipped with advanced High-Velocity Ionized Flow (HVIF) technology and a multi-zone gas delivery unit that make it ideal for precision etching / ashing applications. Additionally, the machine provides automated control, process data storage, and a wide range of gas types, making it suitable for a variety of etching / ashing applications.