Used LAM RESEARCH Alliance 4.1 #293587281 for sale

LAM RESEARCH Alliance 4.1 is a semiconductor etch/aser platform that is capable of providing precision etching, sputtering, and physical vapor deposition services to the semiconductor industry. The equipment is built on an 11-inch by 10-inch platform and is equipped with two 4-inch PVD (Physical Vapor Deposition) chambers. The platform enables a wide range of processes, including etching and cleaning up substrates and depositing protective layers on them. It also offers single- and multiple-layer deposition, ultra-thin film deposition, and etching of MEMS (Micro-Electro-Mechanical Systems). The Alliance 4.1 is capable of handling a maximum wafer size of 4-inch and can process a variety of materials such as Silicon, Silica, and Photoresist. In addition, its built-in control systems allow full control of the etching process, including the timing and process parameters, which results in repeatable and reproducible results. The Alliance 4.1 is ergonomically designed to optimize workflows and allow easy access to all components. Additionally, the system is equipped with a high-resolution mapping capability to allow for mapping of variations in wafers as well as on-wafer temperature distribution. The unit also allows for extra process capability such as the deposition of embedded films and multi-metal films for multilayer applications. The Alliance 4.1 is capable of providing process monitoring and real-time diagnostics, allowing engineers to determine the status of the etch process. Furthermore, it provides a library of standard recipes to make programming easier and it is compatible with industry-standard software platforms. Additionally, the machine is equipped with a built-in safety tool in order to provide safe and reliable operation. Overall, LAM RESEARCH Alliance 4.1 provides an advanced and reliable etching platform for the semiconductor industry. It has various useful features, such as process monitoring, high-resolution mapping, and compatibility with industry-standard software platforms, which makes it a great choice for any application requiring precision etching or deposition.