Used LAM RESEARCH Alliance 4.1 #9182311 for sale
URL successfully copied!
Tap to zoom
ID: 9182311
Wafer Size: 6"
Vintage: 1996
Etcher, 6"
(3) System monitors
TM LID: Cylinder open/close (manual type)
Wafer present sensors (WPS)
TM & VCE Pump option: Single pump type
Fab clean room configuration: Bulkhead
Robot:
BROOKS / MTR 5 / (2) Blades
Aux position 1: Aligner
Transport system control:
Transport VME
Multiplexer PCB
Load lock:
Auto door
VCE Elevator: Bellows seal
Mapping sensor includes
Cassette type: (25) Slots
VCE Vacuum isolation valves
TM Vacuum isolation valves
TM Pneumatic valves
Chamber position 1:
9400SE, 6"
Chamber process: Poly
Turbo pump: SEIKO SEIKI STP-A1303
VAT 65 Pendulum valve
RF Generator TCP: ADVANCED ENERGY RFG1250 13.56MHz
RF Generator bottom: ADVANCED ENERGY Halo 1250 13.57MHz
Chamber position 2:
9400SE, 6"
Chamber process: Poly
Turbo pump: SEIKO SEIKI STP-A1303 (Turbo missing)
VAT 65 Pendulum valve (VAT Valve controller missing)
RF Generator TCP: ADVANCED ENERGY RFG1250 13.56MHz
Chamber position 3:
9400SE, 6"
Chamber process: Poly
Turbo pump: SEIKO SEIKI STP-A1303 (Turbo controller missing)
VAT 65 Pendulum valve (VAT Valve controller missing)
RF Generator TCP: ADVANCED ENERGY RFG1250 13.56MHz
Missing part:
Position 2 / 3: RF Generator bottom: ADVANCED ENERGY Halo 1250 13.57MHz
1996 vintage.
LAM RESEARCH Alliance 4.1 is an etching or ashing equipment, designed specifically for the fabrication of electronic and semiconductor components. It is an advanced platform for the deposition of multiple features on single or multiple substrates. Alliance 4.1 features a high-performance, cost-effective, and technically advanced etching chamber. It delivers robust and reliable etch process performance for a wide variety of processes, materials, and applications. The Alliance 4.1's superior etching capability allows for deposition of features with market-leading precision and high accuracy. This is achieved through its advanced upper and lower electrode structures and the use of precise material-management systems. The system utilizes an inverted angle substrate orientation to ensure a precise etching result. In addition, the Alliance 4.1 has an integrated user interface with advanced control capabilities. The unit is designed to allow users to easily interact with the etching chamber, including programming the specific parameters of the etching process. This advanced control machine can be used to ensure that the desired results are achieved while meeting the cost and process objectives. The Alliance 4.1 features an ultra-thin film precision etching chamber with the capacity to produce features smaller than 5 nanometers. It also provides etching processes that are suitable to meet high-precision needs, while maintaining cost efficiency. Additionally, the Alliance 4.1 etching chamber is designed to provide optimal performance and reliability with minimal maintenance needs. The tool's design enables rapid reaction to process changes and ensures repeatable process results. Furthermore, the asset's maintenance requirements are minimal, making it an excellent choice for cost-sensitive applications. In conclusion, LAM RESEARCH Alliance 4.1 is a cost-effective and high-performance etching model, providing the ability to deposit multiple features on single or multiple substrates with market-leading precision and accuracy. Its integrated user interface and advanced control equipment provide the ability to precisely program the etching space and ensure that the required results are achieved. As a result, the Alliance 4.1 is an excellent choice for high-precision, cost-sensitive applications.
There are no reviews yet