Used LAM RESEARCH Alliance 4520 XL #9255806 for sale

LAM RESEARCH Alliance 4520 XL is a high-performance etcher/asher designed to provide accurate, efficient, and repeatable etching and ashing processes for semiconductor devices. This device features a high-precision bath with excellent uniformity of etch and ash features, ensuring repeatable processes for reliable device performance. This etcher/asher utilizes both traditional etching and electro-chemical ashing (ECA) processes to deliver superior results with the highest product yield. Alliance 4520 XL offers advanced features such as an ultra-low-distortion bath design to ensure that etch and ash processes are repeatable. A compact bath size works to improve delivery of uniform etch and ash results. This device also features an industry-leading dual-sloped glass lid, which minimizes the often unpredictable range of glass buoyancy when using traditional models. This allows for superior etch and ash results with uniformity across the entire bath. LAM RESEARCH Alliance 4520 XL also features a unique plasma-based etch and ash process, which utilizes a high-energy process to deliver better etch and ash results in less time. This process is also scalable to meet the needs of the customer. The etcher/asher also boasts a fast automated process for higher throughput, eliminating the need for manual intervention. Additional features of Alliance 4520 XL include a powerful control system, which allows for precise control of process parameters such as temperature, gas concentration, power, and exposure time. The device also provides feedback on input parameters to ensure that the processes remain precise. This feedback is also used to detect and correct any anomalous etch and ash processes. This etcher/asher is also designed for easy maintenance, featuring a self-cleaning system that can be triggered from the control panel. It also has simple parts replacement processes to minimize downtime and maximize uptime. LAM RESEARCH Alliance 4520 XL is an ideal solution for applications requiring accurate, repeatable etch and ash processes. Its advanced features and reliable performance will ensure that customers can achieve consistent device yield across the entire production process.