Used LAM RESEARCH Alliance 6.0 TCP 9400 PTX #9024652 for sale
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ID: 9024652
Dry etcher, 8"
CASS NEST PLASTIC 8"
Wafer Shape SNNF (Semi Notch No Flat)
SMIF Interface NO
System Information:
Platform type ALLIANCE 6.0
Process chamber qty 3
Software version A2.2-018
SECS/ GEM yes
Chamber Location / Type / Current process:
Position 1 (PM1) TCP9400PTX / Poly etch
Position 2 (PM2) TCP9400PTX / Poly etch
Position 3 (PM3) TCP9400PTX / Poly etch
Position 4 (PM4) none
Etch Chamber:
Chamber type TCP9400PTX
Turbo pump EDWARDS STP-A1303CV80
Turbo N2 fixed or MFC Type Fixed
Helium UPC UPC-8130
Endpoint detector none
Pendulum valve model VAT 65046-PH52-ADE
Chamber Manometer MKS E29B-23813
Turbo Manometer MKS 625A-14375
Foreline Manometer MKS 625A-14059
Helium Manometer yes
Top RF generator model AE / 3155059-026
Bottom RF generator model AE / 3155059-028 (RFG1250 HALO)
TCP Match yes
Bias Match yes
TOP RF Sense Box yes
Bias RF Sense Box yes
Auto Tune Board yes
DIP Board yes
VCI Connected No
Gas configuration and setup:
Chamber volume used for gas cal 36200 ml
Gas Box:
type Extended capability gas box – Phase II
gas box qty 3 (stacking)
manual valve yes on each line
pressure gauge yes on each line
regulator yes on each line
filter yes on final line
Gas Panel Pallet:
gas line qty with N2 purge line 8
gas line qty without N2 purge line 0
MFC type UFC-1661 / UFC-1660 / UFC-8160
Gas line (gas name, MFC size)
PM1
line 1 O2 100 / UFC-1660
line 2 NF3 100 / UFC-1661
line 3 He 200 / UFC-1660
line 4 CF4 200 / UFC-1660
line 5 SO2 100 / UFC-1660
line 6 SF6 200 / UFC-1660
line 7 Ar 200 / UFC-1660
line 8 none
PM2
line 1 O2 100 / UFC-1660
line 2 NF3 100 / UFC-1661
line 3 He 200 / UFC-1660
line 4 CF4 200 / UFC-1660
line 5 SO2 100 / UFC-1660
line 6 SF6 200 / UFC-1660
line 7 Ar 200 / UFC-1660
line 8 none
PM3
line 1 O2 100 / UFC-1661
line 2 NF3 100 / UFC-1661
line 3 He 200 / UFC-1661
line 4 CF4 200 / UFC-1660
line 5 SO2 100 / UFC-1660
line 6 SF6 200 / UFC-1660
line 7 Ar 200 / UFC-1660
line 8 none
Mainframe:
Loadlock Dual VCE Loader / Manual Door open
Robot type BROOKS MagnaTrain 7 (with Dual aluminum blade)
EMO button front, side
Signal tower (front) green, yellow, red
Remotes:
RPM
Qty 1
EMO button yes
Line frequency and voltage 208VAC 3ph
Remote UPS interface yes (105V 1ph)
UPS yes
System monitor display 1 (front)
Heat Exchanger Type:
For Cathode NOAH PRECISION, LLC / Model 3300 (-20 ~ +90degC)
qty 3
Pumps Type:
Transfer Module EBARA A70W (not included in scope, needed to confirm)
PM1 EBARA A30W (not included in scope, needed to confirm)
PM2 EBARA A30W (not included in scope, needed to confirm)
PM3 EBARA A30W (not included in scope, needed to confirm)
Gas Scrubber:
qty 1
Type EBARA GTE-3-0WVT (not included in scope, needed to confirm)
1998 vintage.
LAM RESEARCH Alliance 6.0 TCP 9400 PTX is a powerful etcher/asher designed to meet the most demanding of industrial processing requirements. The PTX features advanced technologies that are engineered to deliver superior performance and efficiency. The equipment boasts a range of features that enable cost-effective and efficient production. It is comprised of a process chamber, a gas source, a thermal source, a gas box, a process sequencer, a substrate size detector, a DC bias power supply, and an RF power supply. This combination of components provides an efficient and productive anisotropic etch and ashing system. The process chamber is designed with special features for uniform and repeatable processing quality. The RF power supply delivers precise and controlled power for precise etching and ashing. The temperature and gas control unit ensure all facets of process chemistry are accurately monitored and controlled to ensure repeatable process results. The gas source is designed for a wide range of capabilities including the delivery of various process gases such as Cl2, SF6, O2, and Ar. The thermal source is integrated into the machine and offers a cost-effective solution for repeatable anisotropic etch and ashing processes. An integrated gas box controls the mix of process gases for precise etching and ashing. The process sequencer provides process control and enables the tool to automatically adjust to various process conditions. The substrate size detection capability ensures accuracy and repeatability of the etching and ashing process. The DC bias power supply allows for enhancement of etching and ashing rates based on substrate material and process conditions. Overall, LAM RESEARCH Alliance 6.0 TCP 9400 PTX is a powerful and reliable etcher/asher, designed to meet the demands of industrial processing facilities. It features sophisticated design and advanced technologies to ensure repeatable results and exceptional performance.
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