Used LAM RESEARCH Alliance 6 #9145733 for sale
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ID: 9145733
Wafer Size: 8"
Vintage: 2000
Transport module, 8"
Robot:
Position: Transfer
Maker: BROOKS
Model: Mag 7
(2) Blades
System monitor:
(3) Monitors
Load lock:
Load lock type: Auto door
VCE Elevator: Bellows
Mapping sensor
VCE Gate valve
VCE Vacuum isolation valves
TM Vacuum isolation valves
TM Pneumatic valves
Cassette type:
(25) Slot cassettes
TM Lid:
Pneumatic cylinder lift
Up / Down actuate switch
Transport system control:
Transport VME ( MVME 147-011, VME335, DIOXVME-240 )
Multiplexer PCB
Light tower PCB
Chamber:
Position I:
Chamber type: Empty
Position II:
Chamber type: Empty
Position III:
Chamber type: Empty
Position IV:
Chamber type: Empty
Aux Position I:
Chamber type: Aligner
AUX Position II:
Chamber type: Empty
Gas boxes:
PM 1
PM 4
PM 2:
MFC Channel Gas MFC Type MFC Size (SCCM)
AC 01 - CHA C4F8 FC-D980CU 50
AC 02 - CHA O2 FC-D780CU 100
AC 03 - CHA CHF3 FC-D780CU 50
AC 04 - CHA CF4 FC-D780CU 200
AC 05 - CHA O2 (30%) HE FC-D780CU 100
AC 06 - CHA C4F6 FC-D780CU 50
AC 07 - CHA CH2F2 FC-D780CU 100
AC 08 - CHA CF4 FC-D780CU 1000
AC 09 - CHA H2 FC-D780CU 1500
AC 10 - CHA Ar FC-D780CU 1000
AC 11 - CHA N2 FC-D780CU 1000
AC 12 - CHA O2 FC-D780CU 3000
PM 3:
MFC Channel Gas MFC Type MFC Size (SCCM)
AC 01 - CHA C4F8 FC-D780CU 50
AC 02 - CHA O2 FC-D780CU 100
AC 03 - CHA CHF3 FC-D780CU 50
AC 04 - CHA CF4 FC-D980CU 200
AC 05 - CHA O2 (30%) HE FC-D780CU 100
AC 06 - CHA C4F6 FC-D780CU 50
AC 07 - CHA CH2F2 FC-D780CU 100
AC 08 - CHA CF4 FC-D780CU 1000
AC 09 - CHA H2 FC-D780CU 1500
AC 10 - CHA Ar FC-D780CU 1000
AC 11 - CHA N2 FC-D780CU 1000
AC 12 - CHA O2 FC-D780CU 3000
Standard signal tower
Wafer present sensors (WPS)
TM & VCE Pump: Single pump type
2000 vintage.
LAM RESEARCH Alliance 6 is a stand-alone etcher and asher designed for high-volume production precision applications in the semiconductor industry. It provides an efficient, cost-effective platform for R&D and production environments. Alliance 6 offers a wide range of features for optimal processing efficiency, high performance, and uniformity. LAM RESEARCH Alliance 6 is a multi-chamber equipment with an automated transfer station that works with up to six cassettes for increased throughput capability. It offers uniform vertical and horizontal profiles, with options for standoff, dielectric and isotropic etch applications. The system design also offers a wide range of etch-slope control and uniformity, along with the ability to optimize etch process control parameters. The unit also offers a wide range of features aimed at controlling particle contamination and prevent process particulate contamination. It employs an automated high vacuum exhaust machine that constantly renews the process environment, preventing the build-up of process by-products. The tool also has an optional scrubber-vacuum feature that efficiently removes particles from the chamber walls. Alliance 6 is designed to operate in a 3-inch or 4-inch 300mm wafer carrier asset, and it features an automated feeder for loading wafers and a robot arm to unload them. It uses a combination of parallel and non-parallel chamber configurations to achieve uniformity and consistent thickness. It also uses multiple-channels, dual-polarity RF power to ensure uniform etching with low defect rate. LAM RESEARCH Alliance 6 features a configurable cathode arrangement, with a main cathode station that has both a platen and grid electrode for optimized temical etch. The model employs advanced diagnostics, including wafer mapping, to ensure accurate etch back action. It also features high temperature control, fast cathode rotation, and chemical delivery equipment for precise chemical control. Alliance 6 utilizes advanced software to control the process parameters throughout the entire run and provide continuous feedback of chamber performance. This allows for continuous optimization of process parameters and uniform profile results. This system is also designed for remote monitoring and data management through the internet and intranet, as well as the ability to transfer recipes and performance data to PCs or network databases.
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