Used LAM RESEARCH Alliance 9100 PTX #293666065 for sale
URL successfully copied!
Tap to zoom
ID: 293666065
Wafer Size: 8"
Vintage: 2000
Oxide etcher, 8"
Non-functional
Robot: MAG 7 (Dual end effector)
(2) Chambers
Wafer type: Notch, 26 slots
EMO Guard ring
SECS/GEM Interface
TCP9100 Process module
Pendulum throttle valve
VAT 65 Gate valve
65046-PH52-ADE1 VAT Step motor
650PM-36PM-1004 VAT Adaptive pressure controller
Gas panel exhaust flange
Gas Pallet Chamber 1 and 2:
Ar (500 sccm, Analog) FC-780C
O2 (2000 sccm, Analog) FC-780C
C4F8 (50s ccm, Analog) FC-780C
CHF3 (100 sccm, Analog) FC-780C
C5F8 (50 sccm, Analog) FC-780C
CH2F2 (100 sccm, Analog) FC-780C
O2 (30 sccm, Analog) FC-780C
CO (200 sccm, Analog) FC-780C
Power supply: 208 VAC, 60 Hz
2000 vintage.
LAM RESEARCH Alliance 9100 PTX is an advanced etcher/asher designed to provide outstandingly precise etching and ashing processes. Utilizing different sources of plasma, including radio frequency (RF) excitation and microwave excitation, Alliance 9100 PTX delivers the highest levels of accuracy and efficiency in a single tool. LAM RESEARCH Alliance 9100 PTX features a modular design for maximum performance and reliability in production. Its tool components are designed for highly precise alignment and repeatability, allowing it to deliver maximum accuracy and uniformity in etching and ashing processes. It also offers two variations of processes, depending on the material which needs to be etched or ashed. The first is a low-pressure etcher/asher, and the second is an Atmospheric Pressure Plasma (APP) system. This allows the machine to provide the most appropriate process for a variety of materials, including polymers, polysilicon, and non-silicon devices. Alliance 9100 PTX is a highly customizable tool, allowing users to customize the process parameters to meet their exact requirements. It can also integrate with LAM's proprietary EPT2 process control systems, giving users access to advanced process control to ensure repeatable, optimized etching and ashing results across multiple runs. Various etching and ashing configurations are also available to satisfy different needs. Overall, LAM RESEARCH Alliance 9100 PTX is an ideal solution for the highly precise etching and ashing needs of industry-leading manufacturers. It provides reliable results that consistently exceed expectations, offering exceptional accuracy and repeatability for a wide range of materials and application requirements. It also provides unparalleled flexibility and process control, allowing users to quickly adjust the process parameters to ensure repeatable, optimized results.
There are no reviews yet