Used LAM RESEARCH Alliance 9600 PTX #9233428 for sale
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ID: 9233428
Wafer Size: 8"
Vintage: 1997
Etcher, 8"
Transfer chamber:
VCE Type: LIP Seal
Aligner: 001-4130-03
Transfer robot: BROOKS Magantran 7
ARM Type: Dual thin blade
Rocker valve P/N: 715-012208-001
LL & TM Pressure gauge: HPS Series 907 / MSK
Cooling station
Turbo pump model: STP-H200C
Etch chamber: PM2 / PM3
Turbo pump: STP-1301L / STP-H1303CV3
Chamber: TCP 9600 PTX
Pressure gauge: MSK E29B-23813 (0.1 Torr) / 625A11TDE (10 Torr)
Throttle gate valve: VAT 65046-PH52-AFI1 / 0052
Source RF generator: RFDS 660-024637-006
Bias RF generator: RFG 1250 HLAO
Configuration of MW chamber: PM1 / PM4
Chamber: Alliance stripper
Throttle gate valve: VAT/64040-PE52-1009/0429
MW Generator: ASTEX FI10021
MFC:
PM1: O2 5000sccm / N2 1000sccm
PM4: O2 5000sccm / N2 1000sccm
Gas panel / Etch chamber: PM1 / PM4
Gas panel: 8 Channels
(6) Gas channels
MFC Model: TYLAN 2950 Series
Gas: PM1 / PM4
Ar 100 sccm
CHF3 100 sccm
O2 200 sccm
N2 50 sccm
CL2 200 sccm
BCL3 200 sccm
AC Rack:
Power supply: 208 VAC, 400 A, 50/60Hz, 3 Phase, 4 Wire
1998 vintage.
LAM RESEARCH Alliance 9600 PTX is an advanced etcher/asher equipment designed to integrate cutting-edge processing technology for the most exact and precise etching and ashing results. This system provides enhanced performance, improved throughput, increased uptime and lower operating costs for users. Alliance 9600 PTX is capable of processing substrates from 75mm to 152mm. This unit is designed to deliver extremely fast cycle times for etching/ashing needs in the semiconductor industry. The Alliance 9600 is equipped with high-end features for superior material processing. With the PEDC technology, ultra-short pulses are used to achieve extremely precise and accurate etching/ashing to facilitate production of devices with smaller and higher densities. The machine is also designed to accommodate both wet-chemical and dry etch/ash processes. The Cross-Flow filter features an integrated filament for fast recovery of post process byproducts. The heated drum design provides excellent uniformity, minimizing variation in surface topography with its improved multi-zone temperature control. The integrated collector stores the post-process wafers for waste collection. LAM RESEARCH Alliance 9600 PTX also offers advanced control abilities. The upgraded InfinityFlex™ Control is a comprehensive software package that provides numerous powerful features such as real time process and recipe tracking, predictive maintenance, recipe optimization and remote diagnostics. The tool also offers a single-button operation and auto-calibration for simple and intuitive user interface. The process accuracy is also optimized with in-situ metrology asset to ensure that precise, consistent, and repeatable results are generated. Alliance 9600 PTX is a reliable and powerful etcher/asher systems, providing advanced capabilities for a wide range of etching/ashing processes in the semiconductor industry. With comprehensive control abilities and improved throughput, LAM RESEARCH Alliance 9600 PTX model helps reduce tool complexity and costs, while decreasing downtime and maximizing process efficiency.
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