Used LAM RESEARCH Alliance A4 4420XL #9169591 for sale

LAM RESEARCH Alliance A4 4420XL
ID: 9169591
Wafer Size: 8"
Vintage: 1996
Etchers, 8" 1996 vintage.
LAM RESEARCH Alliance A4 4420XL is an etcher / asher designed for a wide range of applications requiring high-volume, high-resolution etching. It has been designed with a modular platform that allows it to handle a range of etching processes. The machine has a 4-chamber architecture, with the third chamber used for isotropic etching of Silicon-manganese materials. It offers precise process control and a wide range of process parameters, allowing users to etch complex structures into a range of materials. The A4 4420XL features an onboard high-efficiency powered gas delivery unit that provides a highly controlled, programmable, high-precision etching solution. The etching process depends on a combination of reagents, pressure, and temperature, and LAM RESEARCH have developed specific reagent recipes and custom gas flows in order to produce the best possible results. The machine also features an Optical Edge Detection system that allows it to accurately etch high-precision structures, while the multi-stage pressure gauge offers continuous feedback into the process chamber, allowing for etching uniformity over a long period of time. This etcher / asher is capable of etching at a rate of up to 0.01 microns per second, allowing for a wide range of etching thicknesses for a range of substrates. It also offers flexible process control with the ability to adjust gas flow, pressure, and temperature to meet multi-step processes, such as layer transfer, thick film metal etch, or dicing. Additionally, the A4 4420XL is designed to be compatible with a range of wafer support surfaces, from glass and quartz to silicon and low-k devices. In summary, LAM RESEARCH ALLIANCEA4 4420XL is a high-precision etcher / asher that offers users a versatile solution for a range of etching and ashing processes. It offers a highly efficient package, with an accurate process control system, high-precision etching, and a range of substrates. A number of features, such as the Optical Edge Detection system and the multi-stage pressure gauge, ensure that it is able to produce consistently precise results for both heavily-used and low-volume applications.
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