Used LAM RESEARCH Alliance A4 4520 #9272823 for sale

LAM RESEARCH Alliance A4 4520 is an etcher/asher designed for use in advanced patterning applications. It is a multiple-source etch tool with advanced automation features such as a fully automated substrate positioner, integrated wafer handling, and a high deposition efficiency reactor. This equipment provides a highly precise etch result with high-throughput production capabilities. The system is capable of handling substrates up to 200mm in diameter and can accommodate a range of process gases such as oxygen, Argon, Nitrogen, and chlorine. It also has a multi-stage etch chamber with high-end vacuum turbine technology to support high-pressure operations. The advanced regulator and controller unit enables the adjustment of etch rates in the nanosecond range for precise etch results. The integrated wafer handling machine on Alliance A4 4520 includes an overhead loader and a subsystem that track substrates accurately on the top of the manifold. The wafer handler subsystem has a built-in vision tool that uses optical sensors to monitor the position and orientation of the substrate to ensure alignment with the electrode. The chamber also features an automated plasma monitor and control asset that tracks and regulates plasmas in both pre-etch and post-etch operations. LAM RESEARCH Alliance A4 4520 also features an RF power delivery model with a wide range of power levels that are available for a variety of applications. The tool is capable of creating horizontal surfaces with high dimensional accuracy. It also offers an optional high-dose imaging equipment for high-throughput, low-dose imaging, and ultra-high resolution imaging. Alliance A4 4520 is an excellent choice for advanced patterning applications. It offers precision control with high throughput and is equipped with integrated automation features for high productivity. The integrated wafer handling system, automated plasma monitor and control unit, and the RF power delivery machine make this etcher/asher an efficient and reliable tool for etching.